POTSDAM - Recently, scholars from Japan and Korea have chosen to carry out research at Clarkson Universitys Center for Advanced Materials Processing (CAMP).
Professor Panart Khajornrungruang of the Department of Mechanical Information Science and Technology at the Kyushu Institute of Technology, Japan, is a research associate professor working in Distinguished University Professor and CAMP Director S.V. Babus laboratory.
He is investigating the roles of fine particles used in chemical-mechanical planarization (CMP) by monitoring their movement between the polishing pad and the wafer using an evanescent light field created by a laser beam. This method can be used to observe the motion of particles as small as 25 nanometers. Khajornrungruang is an expert in making real-time measurements using optical techniques and applying them to CMP. He earned his Ph.D. from the Department of Mechanical Engineering and Systems at Osaka University, Japan.
His work is funded by a Japanese government program called KAKENHI, which made it possible for Khajornrungruang to receive Grants-in-Aid money for Young Scientists from the Japan Society for the Promotion of Science.
Yoichi Fujieda, manager of advanced imaging technology, R&D Division of Konica Minolta, Inc., Japan, is also joining Babus lab for three months. His research is in the area of chemical-mechanical planarization. He has work experience that relates to copier machines, the production of toner particles, and the development of functional materials such as plastics.
In addition, Young-Ho Lee is serving as a research scholar in CAMP Distinguished Professor Dan Goias laboratory. His research activities are related to the development of metallic particles for electronic applications. Lee earned a masters degree in chemistry from Sungkyunkwan University in Seoul, Korea, and has research experience with metal powder materials.